Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
In 2019, the market size of Plasma Etching Systems is xx million US$ and it will reach xx million US$ in 2025, growing at a CAGR of xx% from 2019; while in China, the market size is valued at xx million US$ and will increase to xx million US$ in 2025, with a CAGR of xx% during forecast period.
In this report, 2018 has been considered as the base year and 2019 to 2025 as the forecast period to estimate the market size for Plasma Etching Systems.
This report studies the global market size of Plasma Etching Systems, especially focuses on the key regions like United States, European Union, China, and other regions (Japan, Korea, India and Southeast Asia).
This study presents the Plasma Etching Systems production, revenue, market share and growth rate for each key company, and also covers the breakdown data (production, consumption, revenue and market share) by regions, type and applications. history breakdown data from 2014 to 2019, and forecast to 2025.
For top companies in United States, European Union and China, this report investigates and analyzes the production, value, price, market share and growth rate for the top manufacturers, key data from 2014 to 2019.
In global market, the following companies are covered:
Oxford Instruments
ULVAC
Lam Research
AMEC
PlasmaTherm
SAMCO Inc.
Applied Materials, Inc.
Sentech
SPTS Technologies (an Orbotech Company)
GigaLane
CORIAL
Trion Technology
NAURA
Plasma Etch, Inc.
Tokyo Electron Limited
Market Segment by Product Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Others
Market Segment by Application
Semiconductor Industry
Medical Industry
Electronics & Microelectronics
Others
Key Regions split in this report: breakdown data for each region.
United States
China
European Union
Rest of World (Japan, Korea, India and Southeast Asia)
The study objectives are:
To analyze and research the Plasma Etching Systems status and future forecast in United States, European Union and China, involving sales, value (revenue), growth rate (CAGR), market share, historical and forecast.
To present the key Plasma Etching Systems manufacturers, presenting the sales, revenue, market share, and recent development for key players.
To split the breakdown data by regions, type, companies and applications
To analyze the global and key regions market potential and advantage, opportunity and challenge, restraints and risks.
To identify significant trends, drivers, influence factors in global and regions
To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market
In this study, the years considered to estimate the market size of Plasma Etching Systems are as follows:
History Year: 2014-2018
Base Year: 2018
Estimated Year: 2019
Forecast Year 2019 to 2025
Summary:
Get latest Market Research Reports on Plasma Etching Systems. Industry analysis & Market Report on Plasma Etching Systems is a syndicated market report, published as Global (United States, European Union and China) Plasma Etching Systems Market Research Report 2019-2025. It is complete Research Study and Industry Analysis of Plasma Etching Systems market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.