A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.[1] The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed. In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed.
The semiconductors & ICs application segment accounted for the largest share of the global photoresist market in 2017. This segment is expected to continue its dominance during the forecast period. Photoresist is used in the semiconductors industry to imprint the desired circuitry and obtain ICs as the end product.
The Asia-Pacific region accounted for the largest share of the global photoresist market in 2017. Taiwan is estimated to account for the largest share of the Asia-Pacific photoresist market in 2017; however, this market in China is anticipated to grow at the highest CAGR during the forecast period.
Global Photoresist market size will increase to xx Million US$ by 2025, from xx Million US$ in 2018, at a CAGR of xx% during the forecast period. In this study, 2018 has been considered as the base year and 2019 to 2025 as the forecast period to estimate the market size for Photoresist.
This report researches the worldwide Photoresist market size (value, capacity, production and consumption) in key regions like United States, Europe, Asia Pacific (China, Japan) and other regions.
This study categorizes the global Photoresist breakdown data by manufacturers, region, type and application, also analyzes the market status, market share, growth rate, future trends, market drivers, opportunities and challenges, risks and entry barriers, sales channels, distributors and Porter's Five Forces Analysis.
The following manufacturers are covered in this report:
Tokyo Ohka Kogyo
JSR
Dowdupont
Shin-Etsu Chemical
Fujifilm Electronics
Sumitomo Chemical
Merck Az Electronics
Allresist
Avantor Performance Materials
Microchemicals
Toyo Ink
Chimei
MCC
NSCC
LG Chemical
DNP
Daxin
Everlight Chemical
Photoresist Breakdown Data by Type
ArF immersion
ArF dry
KrF
I-line
G-line
Photoresist Breakdown Data by Application
Semiconductors & ICs
LCDs
Printed circuit boards
Others
Photoresist Production Breakdown Data by Region
United States
Europe
China
Japan
Other Regions
Photoresist Consumption Breakdown Data by Region
North America
United States
Canada
Mexico
Asia-Pacific
China
India
Japan
South Korea
Australia
Indonesia
Malaysia
Philippines
Thailand
Vietnam
Europe
Germany
France
UK
Italy
Russia
Rest of Europe
Central & South America
Brazil
Rest of South America
Middle East & Africa
GCC Countries
Turkey
Egypt
South Africa
Rest of Middle East & Africa
The study objectives are:
To analyze and research the global Photoresist capacity, production, value, consumption, status and forecast;
To focus on the key Photoresist manufacturers and study the capacity, production, value, market share and development plans in next few years.
To focuses on the global key manufacturers, to define, describe and analyze the market competition landscape, SWOT analysis.
To define, describe and forecast the market by type, application and region.
To analyze the global and key regions market potential and advantage, opportunity and challenge, restraints and risks.
To identify significant trends and factors driving or inhibiting the market growth.
To analyze the opportunities in the market for stakeholders by identifying the high growth segments.
To strategically analyze each submarket with respect to individual growth trend and their contribution to the market.
To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market.
To strategically profile the key players and comprehensively analyze their growth strategies.
In this study, the years considered to estimate the market size of Photoresist :
History Year: 2014-2018
Base Year: 2018
Estimated Year: 2019
Forecast Year 2019 to 2025
For the data information by region, company, type and application, 2018 is considered as the base year. Whenever data information was unavailable for the base year, the prior year has been considered.
Summary:
Get latest Market Research Reports on Photoresist . Industry analysis & Market Report on Photoresist is a syndicated market report, published as Global Photoresist Market Insights, Forecast to 2025. It is complete Research Study and Industry Analysis of Photoresist market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.