Summary
Imprinting technology is an ancient technique for the reproduction of writings on appropriate supports. Since 1990′s, one of the imprinting techniques, i.e., injection moulding has been used for compact disk (CD) production. More recently, the semiconductor industry is interested in imprint related techniques because of the mass production requirement of future microelectronic circuits with a possible critical dimension down to a few nanometers. At this deep nanometer scale, traditional photolithography is supposed to rule out because of the optical diffraction or material limitations. In fact, the actual minimum feature size in an integrated circuit (IC) is already less than 50 nm and the actual manufacturing systems are already extremely sophisticated and expensive. The semiconductor industry has always been looking for alternative patterning methods in order to follow Moore′s law, which has been formulated to predict the evolution of the technology nodes. Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.
The global Nanoimprint Lithography System market will reach xxx Million USD in 2020 with CAGR xx% 2020-2025. The objective of report is to define, segment, and project the market on the basis of product type, application, and region, and to describe the content about the factors influencing market dynamics, policy, economic, technology and market entry etc.
Based on products type, the report describes major products type share of regional market. Products mentioned as follows:
Hot Embossing (HE)
UV-based Nanoimprint Lithography (UV-NIL)
Micro Contact Printing (μ-CP)
Leading vendors in the market are included based on profile, business performance etc. Vendors mentioned as follows:
Obducat
EV Group
Canon (Molecular Imprints)
Nanonex
SUSS MicroTec
GuangDuo Nano
Based on Application, the report describes major application share of regional market. Application mentioned as follows:
Consumer Electronics
Optical Equipment
Others
Based on region, the report describes major regions market by products and application. Regions mentioned as follows:
Asia-Pacific
North America
Europe
South America
Middle East & Africa
Table of Contents
1 Market Overview
1.1 Objectives of Research
1.1.1 Definition
Figure Nanoimprint Lithography System Picture
1.1.2 Specifications
Table Product Specifications of Nanoimprint Lithography System
1.2 Market Segment
1.2.1 by Type
Table Products Segment of Nanoimprint Lithography System
Table Global Nanoimprint Lithography System Market by Type, 2011-2022 (USD Million)
Summary: Get latest Market Research Reports on Nanoimprint Lithography System . Industry analysis & Market Report on Nanoimprint Lithography System is a syndicated market report, published as Global Nanoimprint Lithography System Market Research Report 2012-2024. It is complete Research Study and Industry Analysis of Nanoimprint Lithography System market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.