Chemical Mechanical Planarization (CMP) is a polishing process used to manufacture wafers for the semiconductor industry. It requires the use of a polishing tool and polishing slurry. The slurry in the tool is delivered to the wafer surface and may contain large particles/agglomerates (> 1 μ) as a result of shipping/handling issues, drying, and interactions within the slurry distribution systems. These large particles can, in turn, increase the level of defectives (scratches) on the semiconductor wafer surface found after the CMP process has been completed. One of the solutions for decreasing the level of defects caused by large slurry particles is through the use of slurry filtration. For these applications, 0.5 to 5 micron filters are typically used.
CMP Slurry Filters are designed to maximize many different semiconductor processes performance by controlling the size, and concentration of slurry particles. Cutting edge CMP filtration technologies lead to higher yields and less defects. By implementing industry leading filter designs, slurry particle size, and quantity of Large Particle Counts (LPCs) can be controlled to specified process parameters.
Market Analysis and Insights: Global Chemical Mechanical Planarization Point-of-Use (POU) Filters Market
The global Chemical Mechanical Planarization Point-of-Use (POU) Filters market was valued at US$ XX in 2020 and will reach US$ XX million by the end of 2027, growing at a CAGR of XX% during 2022-2027.
Global Chemical Mechanical Planarization Point-of-Use (POU) Filters Scope and Market Size
The global Chemical Mechanical Planarization Point-of-Use (POU) Filters market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Chemical Mechanical Planarization Point-of-Use (POU) Filters market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2016-2027.
Segment by Type
Removal Rating < 0.5 µm
0.5 µm≤Removal Rating 5 µm
Segment by Application
300 mm Wafer
200 mm Wafer
Others
The Chemical Mechanical Planarization Point-of-Use (POU) Filters market is analysed and market size information is provided by regions (countries). Segment by Application, the Chemical Mechanical Planarization Point-of-Use (POU) Filters market is segmented into North America, Europe, China, Japan, Southeast Asia, India and Other Regions.
By Company
Entegris
Pall
Cobetter
3M Company
Critical Process Filtration, INC
Graver Technologies
Parker Hannifin Corporation
Roki Techno Co Ltd.
Summary:
Get latest Market Research Reports on Chemical Mechanical Planarization Point-of-Use (POU) Filters. Industry analysis & Market Report on Chemical Mechanical Planarization Point-of-Use (POU) Filters is a syndicated market report, published as Global Chemical Mechanical Planarization Point-of-Use (POU) Filters Sales Market Report 2021. It is complete Research Study and Industry Analysis of Chemical Mechanical Planarization Point-of-Use (POU) Filters market, to understand, Market Demand, Growth, trends analysis and Factor Influencing market.